Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Plane ITO (indium tin oxide) target material stacking sintering method
The invention relates to the technical field of target material sintering, in particular to a planar ITO target material stacking sintering method which comprises the steps that multiple rows of gaskets are placed on a supporting plate, and a first sintering bearing medium is scattered; placing a piece of intermediate target material on a gasket, and scattering a sintering body on the intermediate target material to obtain a sintering matrix; the other piece of middle target material is placed on the sintering base body, and a sintering body is obtained; the melting point and the use temperature of the first sintering bearing medium and the sintering bearing bodies are both higher than the melting point of the target materials, the first sintering bearing medium and the sintering bearing bodies do not react with the target materials, the sintering bearing bodies are scattered between the target materials, the target materials are prevented from being sintered together in the sintering process, and in one-time sintering, the sintering efficiency is greatly improved. The multiple target materials are sintered in a stacked mode, the sintering amount of one furnace is compared with that of multiple furnaces in the prior art, and therefore the usage amount of sintering furnaces and the sintering cost are greatly reduced, and the production efficiency is improved.
本发明涉及靶材烧结技术领域，具体涉及一种平面ITO靶材叠烧方法，包括：在支撑板上摆放多排垫片，并撒上第一承烧介质；将一片中间靶材放置在垫片上，并在中间靶材上撒上承烧体，得到烧结基体；将另一片中间靶材放置在烧结基体上，得到烧结体；将多个烧结体放入烧结炉内进行烧结，得到平面ITO靶材，本发明设置的第一承烧介质和承烧体的熔点和使用温度均高于靶材的熔点，并且不与靶材反应，在靶材与靶材之间撒上承烧体，防止靶材在烧结时烧结在一起，并且在一次烧结中，通过将多个靶材进行叠加烧结，一炉的烧结量相对于原来的多炉，从而极大的减少烧结炉使用量及烧结成本，提高了生产效率。
Plane ITO (indium tin oxide) target material stacking sintering method
The invention relates to the technical field of target material sintering, in particular to a planar ITO target material stacking sintering method which comprises the steps that multiple rows of gaskets are placed on a supporting plate, and a first sintering bearing medium is scattered; placing a piece of intermediate target material on a gasket, and scattering a sintering body on the intermediate target material to obtain a sintering matrix; the other piece of middle target material is placed on the sintering base body, and a sintering body is obtained; the melting point and the use temperature of the first sintering bearing medium and the sintering bearing bodies are both higher than the melting point of the target materials, the first sintering bearing medium and the sintering bearing bodies do not react with the target materials, the sintering bearing bodies are scattered between the target materials, the target materials are prevented from being sintered together in the sintering process, and in one-time sintering, the sintering efficiency is greatly improved. The multiple target materials are sintered in a stacked mode, the sintering amount of one furnace is compared with that of multiple furnaces in the prior art, and therefore the usage amount of sintering furnaces and the sintering cost are greatly reduced, and the production efficiency is improved.
本发明涉及靶材烧结技术领域，具体涉及一种平面ITO靶材叠烧方法，包括：在支撑板上摆放多排垫片，并撒上第一承烧介质；将一片中间靶材放置在垫片上，并在中间靶材上撒上承烧体，得到烧结基体；将另一片中间靶材放置在烧结基体上，得到烧结体；将多个烧结体放入烧结炉内进行烧结，得到平面ITO靶材，本发明设置的第一承烧介质和承烧体的熔点和使用温度均高于靶材的熔点，并且不与靶材反应，在靶材与靶材之间撒上承烧体，防止靶材在烧结时烧结在一起，并且在一次烧结中，通过将多个靶材进行叠加烧结，一炉的烧结量相对于原来的多炉，从而极大的减少烧结炉使用量及烧结成本，提高了生产效率。
Plane ITO (indium tin oxide) target material stacking sintering method
一种平面ITO靶材叠烧方法
CHEN GUANGYUAN (Autor:in) / ZENG TAN (Autor:in) / ZENG DUNFENG (Autor:in) / WANG ZHIQIANG (Autor:in) / MA JIANBAO (Autor:in)
21.07.2023
Patent
Elektronische Ressource
Chinesisch
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