Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Method for sintering ITO (Indium Tin Oxide) planar target material in stacked sintering mode
The invention relates to the technical field of target materials, in particular to a method for sintering an ITO planar target material in a stacked sintering mode, the method comprises the steps of raw material selection, slurry preparation, spray granulation, primary forming, secondary forming and target material sintering, the stacked sintering mode is adopted in target material sintering, and the number of secondary plain blanks entering a furnace can be greatly increased through the stacked sintering mode; therefore, the sintering cost is reduced, and the warping degree of the target material prepared by adopting the stack sintering mode is lower than that of the target material prepared without adopting the stack sintering mode.
本发明涉及靶材技术领域，具体涉及一种叠烧方式烧结ITO平面靶材的方法，所述方法包括原料选择、浆料制备、喷雾造粒、一次成型、二次成型、靶材烧结，其中靶材烧结采用叠烧方式，所述叠烧方式可以大大增加每炉二次素胚的进炉数量，从而降低烧结成本，且采用叠烧方式制备的靶材曲翘度低于不采用叠烧方式制备的靶材。
Method for sintering ITO (Indium Tin Oxide) planar target material in stacked sintering mode
The invention relates to the technical field of target materials, in particular to a method for sintering an ITO planar target material in a stacked sintering mode, the method comprises the steps of raw material selection, slurry preparation, spray granulation, primary forming, secondary forming and target material sintering, the stacked sintering mode is adopted in target material sintering, and the number of secondary plain blanks entering a furnace can be greatly increased through the stacked sintering mode; therefore, the sintering cost is reduced, and the warping degree of the target material prepared by adopting the stack sintering mode is lower than that of the target material prepared without adopting the stack sintering mode.
本发明涉及靶材技术领域，具体涉及一种叠烧方式烧结ITO平面靶材的方法，所述方法包括原料选择、浆料制备、喷雾造粒、一次成型、二次成型、靶材烧结，其中靶材烧结采用叠烧方式，所述叠烧方式可以大大增加每炉二次素胚的进炉数量，从而降低烧结成本，且采用叠烧方式制备的靶材曲翘度低于不采用叠烧方式制备的靶材。
Method for sintering ITO (Indium Tin Oxide) planar target material in stacked sintering mode
一种叠烧方式烧结ITO平面靶材的方法
CHEN GUANGYUAN (Autor:in) / WANG ZHIQIANG (Autor:in) / ZENG TAN (Autor:in) / ZENG DUNFENG (Autor:in)
24.11.2023
Patent
Elektronische Ressource
Chinesisch
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