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Indium oxide doped titanium tantalum cerium target material and preparation method thereof
The invention belongs to the technical field of preparation of oxide target materials, and discloses an indium oxide doped titanium tantalum cerium target material and a preparation method thereof. The preparation method comprises the following steps: weighing indium oxide powder, titanium oxide powder, tantalum oxide powder and cerium oxide powder in a molar ratio of (90.5-92.5): (1.5-2.5): (3-5): (1.5-2.5), then adding the indium oxide powder, the titanium oxide powder, the tantalum oxide powder and the cerium oxide powder and a dispersing agent into pure water, stirring and dispersing uniformly, and performing wet grinding to obtain slurry I; adding indium oxide powder, a dispersing agent and water, and performing wet grinding to obtain slurry II; adding a binder, mixing, and carrying out wet grinding to obtain slurry III; carrying out spray granulation, mixing and screening to obtain mixed powder; and finally, degreasing and sintering after mould pressing and cold isostatic pressing to obtain the indium oxide doped titanium-tantalum-cerium target material. According to the preparation method, various properties of the target material can be remarkably improved by limiting the composition proportion of each oxide powder and matching with a specific preparation process.
本发明属于氧化物靶材制备技术领域，公开了一种氧化铟掺杂钛钽铈靶材及其制备方法。所述制备方法为：按摩尔比为90.5～92.5:1.5～2.5:3～5:1.5～2.5称取氧化铟、氧化钛、氧化钽和氧化铈粉末，然后与分散剂加入到纯水中搅拌分散均匀，湿法研磨得到浆料一；再加入氧化铟粉末、分散剂和水经过湿法研磨得到浆料二；再加入粘结剂混合后经过湿法研磨得到浆料三；通过喷雾造粒，再进行混料和筛分，得到混合粉末；最后经过模压和冷等静压后脱脂、烧结，得到氧化铟掺杂钛钽铈靶材。本发明通过限定各氧化物粉末的成分配比及配合特定的制备工艺，可显著提高靶材的各项性能。
Indium oxide doped titanium tantalum cerium target material and preparation method thereof
The invention belongs to the technical field of preparation of oxide target materials, and discloses an indium oxide doped titanium tantalum cerium target material and a preparation method thereof. The preparation method comprises the following steps: weighing indium oxide powder, titanium oxide powder, tantalum oxide powder and cerium oxide powder in a molar ratio of (90.5-92.5): (1.5-2.5): (3-5): (1.5-2.5), then adding the indium oxide powder, the titanium oxide powder, the tantalum oxide powder and the cerium oxide powder and a dispersing agent into pure water, stirring and dispersing uniformly, and performing wet grinding to obtain slurry I; adding indium oxide powder, a dispersing agent and water, and performing wet grinding to obtain slurry II; adding a binder, mixing, and carrying out wet grinding to obtain slurry III; carrying out spray granulation, mixing and screening to obtain mixed powder; and finally, degreasing and sintering after mould pressing and cold isostatic pressing to obtain the indium oxide doped titanium-tantalum-cerium target material. According to the preparation method, various properties of the target material can be remarkably improved by limiting the composition proportion of each oxide powder and matching with a specific preparation process.
本发明属于氧化物靶材制备技术领域，公开了一种氧化铟掺杂钛钽铈靶材及其制备方法。所述制备方法为：按摩尔比为90.5～92.5:1.5～2.5:3～5:1.5～2.5称取氧化铟、氧化钛、氧化钽和氧化铈粉末，然后与分散剂加入到纯水中搅拌分散均匀，湿法研磨得到浆料一；再加入氧化铟粉末、分散剂和水经过湿法研磨得到浆料二；再加入粘结剂混合后经过湿法研磨得到浆料三；通过喷雾造粒，再进行混料和筛分，得到混合粉末；最后经过模压和冷等静压后脱脂、烧结，得到氧化铟掺杂钛钽铈靶材。本发明通过限定各氧化物粉末的成分配比及配合特定的制备工艺，可显著提高靶材的各项性能。
Indium oxide doped titanium tantalum cerium target material and preparation method thereof
一种氧化铟掺杂钛钽铈靶材及其制备方法
GU DESHENG (Autor:in) / SHAO XUELIANG (Autor:in) / LI KAIJIE (Autor:in) / LUO SISHI (Autor:in) / ZHANG XINGYU (Autor:in)
25.08.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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