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Indium titanium tantalum cerium oxide target material, preparation method thereof and coated glass sheet
The invention belongs to the technical field of semiconductors, and discloses an indium-titanium-tantalum-cerium oxide target material which is obtained by sintering an indium-cerium-tantalum-titanium oxide precursor after dry pressing and cold isostatic pressing treatment, and metal oxides in the indium-cerium-tantalum-titanium oxide precursor are composed of indium oxide, cerium oxide, tantalum oxide and titanium oxide according to the weight ratio of (98.73-99.42): (0.43-0.19): (0.64-0.30): (0.20-0.09). According to the target material, the process of sintering after dry pressing and cold isostatic pressing treatment is adopted, and formula optimization is combined, so that the sheet resistance, transmittance and mobility of coated glass can be improved. Meanwhile, the invention also provides a preparation method of the target material and coated glass.
本发明属于半导体技术领域，公开了一种氧化铟钛钽铈靶材，由氧化铟铈钽钛前驱体经过干压和冷等静压处理后烧结得到，氧化铟铈钽钛前驱体中的金属氧化物由氧化铟、氧化铈、氧化钽、氧化钛以重量比98.73～99.42：0.43～0.19：0.64～0.30：0.20～0.09的比例组成。该靶材采用干压和冷等静压处理后烧结的工艺，结合配方优化，可改善镀膜玻璃的方阻、透过率、迁移率。同时，本发明还提供了该靶材的制备方法和镀膜玻璃。
Indium titanium tantalum cerium oxide target material, preparation method thereof and coated glass sheet
The invention belongs to the technical field of semiconductors, and discloses an indium-titanium-tantalum-cerium oxide target material which is obtained by sintering an indium-cerium-tantalum-titanium oxide precursor after dry pressing and cold isostatic pressing treatment, and metal oxides in the indium-cerium-tantalum-titanium oxide precursor are composed of indium oxide, cerium oxide, tantalum oxide and titanium oxide according to the weight ratio of (98.73-99.42): (0.43-0.19): (0.64-0.30): (0.20-0.09). According to the target material, the process of sintering after dry pressing and cold isostatic pressing treatment is adopted, and formula optimization is combined, so that the sheet resistance, transmittance and mobility of coated glass can be improved. Meanwhile, the invention also provides a preparation method of the target material and coated glass.
本发明属于半导体技术领域，公开了一种氧化铟钛钽铈靶材，由氧化铟铈钽钛前驱体经过干压和冷等静压处理后烧结得到，氧化铟铈钽钛前驱体中的金属氧化物由氧化铟、氧化铈、氧化钽、氧化钛以重量比98.73～99.42：0.43～0.19：0.64～0.30：0.20～0.09的比例组成。该靶材采用干压和冷等静压处理后烧结的工艺，结合配方优化，可改善镀膜玻璃的方阻、透过率、迁移率。同时，本发明还提供了该靶材的制备方法和镀膜玻璃。
Indium titanium tantalum cerium oxide target material, preparation method thereof and coated glass sheet
氧化铟钛钽铈靶材及其制备方法和镀膜玻璃片
LUO SISHI (Autor:in) / LI KAIJIE (Autor:in) / SHAO XUELIANG (Autor:in) / GU DESHENG (Autor:in) / ZHANG XINGYU (Autor:in)
19.09.2023
Patent
Elektronische Ressource
Chinesisch
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