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Preparation method of high-density molybdenum tantalum oxide target material
The invention provides a preparation method of a high-density molybdenum tantalum oxide target material, which comprises the following steps: roasting ammonium dimolybdate to obtain molybdenum trioxide powder; mixing molybdenum trioxide powder and tantalum oxide powder to obtain mixed powder, and adding a binder to obtain a mixed material; loading the mixed material into a mold, carrying out cold isostatic pressing treatment, degassing and degumming, and carrying out hot isostatic pressing treatment to obtain the high-density molybdenum tantalum oxide target material. According to the preparation method, the high-density molybdenum tantalum oxide target material is prepared, meanwhile, the yield of the molybdenum tantalum oxide target material is greatly improved, and the preparation method has large-scale application and popularization prospects.
本发明提供一种高致密度氧化钼钽靶材的制备方法,所述制备方法包括将二钼酸铵进行焙解处理,得到三氧化钼粉;混合三氧化钼粉和氧化钽粉得到混合粉末,加入粘结剂,得到混合物料;将混合物料装入模具中,进行冷等静压处理,之后经脱气除胶处理后,进行热等静压处理,得到所述高致密度氧化钼钽靶材。本发明所述制备方法制备得到了高致密度的氧化钼钽靶材,同时大大提高了氧化钼钽靶材的成品率,具有大规模推广应用前景。
Preparation method of high-density molybdenum tantalum oxide target material
The invention provides a preparation method of a high-density molybdenum tantalum oxide target material, which comprises the following steps: roasting ammonium dimolybdate to obtain molybdenum trioxide powder; mixing molybdenum trioxide powder and tantalum oxide powder to obtain mixed powder, and adding a binder to obtain a mixed material; loading the mixed material into a mold, carrying out cold isostatic pressing treatment, degassing and degumming, and carrying out hot isostatic pressing treatment to obtain the high-density molybdenum tantalum oxide target material. According to the preparation method, the high-density molybdenum tantalum oxide target material is prepared, meanwhile, the yield of the molybdenum tantalum oxide target material is greatly improved, and the preparation method has large-scale application and popularization prospects.
本发明提供一种高致密度氧化钼钽靶材的制备方法,所述制备方法包括将二钼酸铵进行焙解处理,得到三氧化钼粉;混合三氧化钼粉和氧化钽粉得到混合粉末,加入粘结剂,得到混合物料;将混合物料装入模具中,进行冷等静压处理,之后经脱气除胶处理后,进行热等静压处理,得到所述高致密度氧化钼钽靶材。本发明所述制备方法制备得到了高致密度的氧化钼钽靶材,同时大大提高了氧化钼钽靶材的成品率,具有大规模推广应用前景。
Preparation method of high-density molybdenum tantalum oxide target material
一种高致密度氧化钼钽靶材的制备方法
YAO LIJUN (Autor:in) / PAN JIE (Autor:in) / WANG XUEZE (Autor:in) / WU DONGQING (Autor:in) / HUANG JIEWEN (Autor:in)
29.09.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
/
B28B
Formgeben von Ton oder anderen keramischen Stoffzusammensetzungen, Schlacke oder von Mischungen, die zementartiges Material enthalten, z.B. Putzmörtel
,
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
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