Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Preparation method of high-surface-flatness vacuum chuck for wafer processing
The invention discloses a preparation method of a high-surface-flatness vacuum chuck for wafer processing, which is characterized in that hydratable magnesium oxide without chloride ions and tea polyphenol are used as raw materials, and a high-surface-flatness porous ceramic wafer is prepared by means of filter pressing forming and high-temperature sintering. The pore diameter of the prepared porous ceramic wafer is 80-300 nanometers, the porosity is 42-67%, the flatness of the unpolished surface is smaller than 20 nanometers, and the porous ceramic wafer is put into a metal support to be made into a vacuum chuck with high surface flatness.
本发明公布了一种高表面平整度用于晶圆加工的真空吸盘的制备方法，该方法使用不含氯离子可水合氧化镁和茶多酚为原料，通过压滤成型和高温烧结的方式制备高表面平整度的多孔陶瓷片。制备得到的多孔陶瓷片的孔径为80～300纳米，孔隙率42％～67％表面未经打磨的平整度小于20纳米，将该多孔陶瓷片装入金属托具中，可制成高表面平整度的真空吸盘。
Preparation method of high-surface-flatness vacuum chuck for wafer processing
The invention discloses a preparation method of a high-surface-flatness vacuum chuck for wafer processing, which is characterized in that hydratable magnesium oxide without chloride ions and tea polyphenol are used as raw materials, and a high-surface-flatness porous ceramic wafer is prepared by means of filter pressing forming and high-temperature sintering. The pore diameter of the prepared porous ceramic wafer is 80-300 nanometers, the porosity is 42-67%, the flatness of the unpolished surface is smaller than 20 nanometers, and the porous ceramic wafer is put into a metal support to be made into a vacuum chuck with high surface flatness.
本发明公布了一种高表面平整度用于晶圆加工的真空吸盘的制备方法，该方法使用不含氯离子可水合氧化镁和茶多酚为原料，通过压滤成型和高温烧结的方式制备高表面平整度的多孔陶瓷片。制备得到的多孔陶瓷片的孔径为80～300纳米，孔隙率42％～67％表面未经打磨的平整度小于20纳米，将该多孔陶瓷片装入金属托具中，可制成高表面平整度的真空吸盘。
Preparation method of high-surface-flatness vacuum chuck for wafer processing
一种高表面平整度用于晶圆加工的真空吸盘的制备方法
WANG YIFAN (Autor:in) / QIU GUOFENG (Autor:in) / PAN ZHENHAO (Autor:in) / WANG XIYU (Autor:in) / LUO ZHENGJIE (Autor:in) / LIN YANNA (Autor:in)
30.07.2024
Patent
Elektronische Ressource
Chinesisch
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