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CONDUCTIVE COMPOSITION AND METALLIZED SUBSTRATE AND MANUFACTURING METHOD THEREOF
To provide a conductive composition capable of forming a conductive part having high adhesion to a ceramic substrate, and capable of manufacturing a metallized substrate having high plating resistance and reliability.SOLUTION: A conductive composition is prepared by combining Ag particles (A) made of Ag small particles (A1) having a particle size smaller than 1.2 μm and Ag large particles (A2) having a particle size equal to or larger than 1.2 μm, a metal component (B) made of a Mn component (B1), an Fe component (B2) and a Cu component (B3) and containing an organometallic compound, and glass particles (C). The organometallic compound may be a metal carboxylate. A ratio of the metal component (B) may be 0.5 to 5 pts.mass relative to 100 pts.mass of the Ag particles (A), in terms of metal element. The glass particles (C) may contain bismuth-based glass particles and/or zinc-based glass particles.SELECTED DRAWING: None
【課題】セラミックス基板に対して密着性が高い導電部を形成でき、かつ耐めっき性および信頼性の高いメタライズド基板を製造できる導電性組成物を提供する。【解決手段】粒径1.2μm未満のAg小粒子(A1)および粒径1.2μm以上のAg大粒子(A2)からなるAg粒子(A)と、Mn成分(B1)、Fe成分(B2)およびCu成分(B3)からなり、かつ有機金属化合物を含む金属成分(B)と、ガラス粒子(C)とを組み合わせて導電性組成物を調製する。前記有機金属化合物はカルボン酸金属塩であってもよい。前記金属成分(B)の割合は、金属元素換算で、Ag粒子(A)100質量部に対して0.5〜5質量部であってもよい。前記ガラス粒子(C)はビスマス系ガラス粒子および/または亜鉛系ガラス粒子を含んでいてもよい。【選択図】なし
CONDUCTIVE COMPOSITION AND METALLIZED SUBSTRATE AND MANUFACTURING METHOD THEREOF
To provide a conductive composition capable of forming a conductive part having high adhesion to a ceramic substrate, and capable of manufacturing a metallized substrate having high plating resistance and reliability.SOLUTION: A conductive composition is prepared by combining Ag particles (A) made of Ag small particles (A1) having a particle size smaller than 1.2 μm and Ag large particles (A2) having a particle size equal to or larger than 1.2 μm, a metal component (B) made of a Mn component (B1), an Fe component (B2) and a Cu component (B3) and containing an organometallic compound, and glass particles (C). The organometallic compound may be a metal carboxylate. A ratio of the metal component (B) may be 0.5 to 5 pts.mass relative to 100 pts.mass of the Ag particles (A), in terms of metal element. The glass particles (C) may contain bismuth-based glass particles and/or zinc-based glass particles.SELECTED DRAWING: None
【課題】セラミックス基板に対して密着性が高い導電部を形成でき、かつ耐めっき性および信頼性の高いメタライズド基板を製造できる導電性組成物を提供する。【解決手段】粒径1.2μm未満のAg小粒子(A1)および粒径1.2μm以上のAg大粒子(A2)からなるAg粒子(A)と、Mn成分(B1)、Fe成分(B2)およびCu成分(B3)からなり、かつ有機金属化合物を含む金属成分(B)と、ガラス粒子(C)とを組み合わせて導電性組成物を調製する。前記有機金属化合物はカルボン酸金属塩であってもよい。前記金属成分(B)の割合は、金属元素換算で、Ag粒子(A)100質量部に対して0.5〜5質量部であってもよい。前記ガラス粒子(C)はビスマス系ガラス粒子および/または亜鉛系ガラス粒子を含んでいてもよい。【選択図】なし
CONDUCTIVE COMPOSITION AND METALLIZED SUBSTRATE AND MANUFACTURING METHOD THEREOF
導電性組成物およびメタライズド基板ならびにそれらの製造方法
TOMIGA DAIKI (Autor:in)
10.12.2020
Patent
Elektronische Ressource
Japanisch
IPC:
H01B
CABLES
,
Kabel
/
C04B
Kalk
,
LIME
/
C08K
Verwendung von anorganischen oder nichtmakromolekularen organischen Stoffen als Zusatzstoffe
,
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
/
C08L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
,
Massen auf Basis makromolekularer Verbindungen
/
H05K
PRINTED CIRCUITS
,
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