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    COMPONENT FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK

    Neue Suche nach: HORIUCHI MICHIO
    Neue Suche nach: TSUNO MASAYA

    To achieve monitoring of an occurrence state of ultraviolet ray in a semiconductor manufacturing process.SOLUTION: A component for electrostatic chuck, which constitutes an electrostatic chuck absorbing an object using electrostatic force, contains a lanthanoid element in a part of material and when electromagnetic waves with a wavelength range of less than 400 nm are radiated, emits light with a different wavelength region from the wavelength region.SELECTED DRAWING: Figure 1

    【課題】半導体製造プロセスにおける紫外線の発生状況をモニタリングすること。【解決手段】静電チャック用部材は、静電力を用いて対象物を吸着する静電チャックを構成する静電チャック用部材であって、材料の一部にランタノイド元素を含み、４００ｎｍ未満の波長領域の電磁波が照射された場合に、当該波長領域とは異なる波長領域の光を発する。【選択図】図１

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    COMPONENT FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK

    Neue Suche nach: HORIUCHI MICHIO
    Neue Suche nach: TSUNO MASAYA

    To achieve monitoring of an occurrence state of ultraviolet ray in a semiconductor manufacturing process.SOLUTION: A component for electrostatic chuck, which constitutes an electrostatic chuck absorbing an object using electrostatic force, contains a lanthanoid element in a part of material and when electromagnetic waves with a wavelength range of less than 400 nm are radiated, emits light with a different wavelength region from the wavelength region.SELECTED DRAWING: Figure 1

    【課題】半導体製造プロセスにおける紫外線の発生状況をモニタリングすること。【解決手段】静電チャック用部材は、静電力を用いて対象物を吸着する静電チャックを構成する静電チャック用部材であって、材料の一部にランタノイド元素を含み、４００ｎｍ未満の波長領域の電磁波が照射された場合に、当該波長領域とは異なる波長領域の光を発する。【選択図】図１

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    COMPONENT FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK

    Neue Suche nach: HORIUCHI MICHIO
    Neue Suche nach: TSUNO MASAYA

    To achieve monitoring of an occurrence state of ultraviolet ray in a semiconductor manufacturing process.SOLUTION: A component for electrostatic chuck, which constitutes an electrostatic chuck absorbing an object using electrostatic force, contains a lanthanoid element in a part of material and when electromagnetic waves with a wavelength range of less than 400 nm are radiated, emits light with a different wavelength region from the wavelength region.SELECTED DRAWING: Figure 1

    【課題】半導体製造プロセスにおける紫外線の発生状況をモニタリングすること。【解決手段】静電チャック用部材は、静電力を用いて対象物を吸着する静電チャックを構成する静電チャック用部材であって、材料の一部にランタノイド元素を含み、４００ｎｍ未満の波長領域の電磁波が照射された場合に、当該波長領域とは異なる波長領域の光を発する。【選択図】図１

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    Titel:

    COMPONENT FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK

    Weitere Titelangaben:

    静電チャック用部材及び静電チャック

    Beteiligte:

    HORIUCHI MICHIO (Autor:in) / TSUNO MASAYA (Autor:in)

    Erscheinungsdatum:

    16.02.2022

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Japanisch

    Klassifikation:

    IPC:  H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / C04B Kalk , LIME / H02N Elektrische Maschinen, soweit nicht anderweitig vorgesehen , ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR

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