Fachinformationsdienst BAUdigital

Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik

    SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, AND METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM

    Neue Suche nach: EBATA KAZUAKI
    Neue Suche nach: NISHIMURA MAMI
    Neue Suche nach: TAJIMA NOZOMI

    A sputtering target including an oxide that includes an indium element (In), a tin element (Sn), a zinc element (Zn) and an aluminum element (Al), and including a homologous structure compound represented by InAlO3(ZnO)m (m is 0.1 to 10), wherein the atomic ratio of the indium element, the tin element, the zinc element and the aluminum element satisfies specific requirements.

    Zugriff

    Download

    Zugriff

    Download

    Seitennavigation

    Dokumentinformationen
    Ähnliche Titel

    Exportieren, teilen und zitieren

    SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, AND METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM

    Neue Suche nach: EBATA KAZUAKI
    Neue Suche nach: NISHIMURA MAMI
    Neue Suche nach: TAJIMA NOZOMI

    A sputtering target including an oxide that includes an indium element (In), a tin element (Sn), a zinc element (Zn) and an aluminum element (Al), and including a homologous structure compound represented by InAlO3(ZnO)m (m is 0.1 to 10), wherein the atomic ratio of the indium element, the tin element, the zinc element and the aluminum element satisfies specific requirements.

    Zugriff

    Download

    SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, AND METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM

    Neue Suche nach: EBATA KAZUAKI
    Neue Suche nach: NISHIMURA MAMI
    Neue Suche nach: TAJIMA NOZOMI

    A sputtering target including an oxide that includes an indium element (In), a tin element (Sn), a zinc element (Zn) and an aluminum element (Al), and including a homologous structure compound represented by InAlO3(ZnO)m (m is 0.1 to 10), wherein the atomic ratio of the indium element, the tin element, the zinc element and the aluminum element satisfies specific requirements.

    Zugriff

    Download

    Zugriff

    Download

    Seitennavigation

    Dokumentinformationen
    Ähnliche Titel

    Exportieren, teilen und zitieren

    Dokumentinformationen
    Titel:

    SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, AND METHOD FOR PRODUCING OXIDE SEMICONDUCTOR THIN FILM

    Beteiligte:

    EBATA KAZUAKI (Autor:in) / NISHIMURA MAMI (Autor:in) / TAJIMA NOZOMI (Autor:in)

    Erscheinungsdatum:

    31.01.2019

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Englisch

    Klassifikation:

    IPC:  H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL

    Ähnliche Titel

    Sputtering target, oxide semiconductor thin film, and method for producing oxide semiconductor thin film

    EBATA KAZUAKI / NISHIMURA MAMI / TAJIMA NOZOMI | Europäisches Patentamt | 2022

    Freier Zugriff

    Sputtering target, method for producing sputtering target, oxide semiconductor thin film, thin film semiconductor device, and method for producing thin film semiconductor device

    TANINO KENTA / KOBAYASHI MOTOSHI / HANNA TAKU et al. | Europäisches Patentamt | 2024

    Freier Zugriff

    SPUTTERING TARGET FOR OXIDE SEMICONDUCTOR THIN FILM FORMATION, METHOD FOR PRODUCING SPUTTERING TARGET FOR OXIDE SEMICONDUCTOR THIN FILM FORMATION, OXIDE SEMICONDUCTOR THIN FILM, AND THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME

    TANINO KENTA / HANNA TAKU / TAKEUCHI MASATO et al. | Europäisches Patentamt | 2024

    Freier Zugriff

    SPUTTERING TARGET FOR FORMATION OF OXIDE SEMICONDUCTOR THIN FILM, METHOD FOR PRODUCING SPUTTERING TARGET FOR FORMATION OF OXIDE SEMICONDUCTOR THIN FILM, OXIDE SEMICONDUCTOR THIN FILM, THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME

    TANINO KENTA / HANNA TAKU / TAKEUCHI MASATO et al. | Europäisches Patentamt | 2024

    Freier Zugriff

    SPUTTERING TARGET, METHOD FOR PRODUCING SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME

    TANINO KENTA / KOBAYASHI MOTOSHI / HANNA TAKU et al. | Europäisches Patentamt | 2023

    Freier Zugriff
    Nach oben