The Physics of the Sputter Erosion Process: Fid-Bau Portal

Fachinformationsdienst BAUdigital

Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik

The Physics of the Sputter Erosion Process

Urbassek, Herbert M.

When an energetic atom or ion hits a solid surface, atoms, molecules and clusters may be ejected as a consequence of the energy and momentum deposited in the solid. This phenomenon is known as sputtering and has been first described in 1853, when a glow discharge cathode was pulverized.¹ Sputtering constitutes a process that is of considerable importance in the field of glow discharges, plasma treatment of materials, and plasma deposition techniques, cf. elsewhere in these proceedings.²

Zugriff

Zugriff prüfen

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

The Physics of the Sputter Erosion Process

Urbassek, Herbert M.

When an energetic atom or ion hits a solid surface, atoms, molecules and clusters may be ejected as a consequence of the energy and momentum deposited in the solid. This phenomenon is known as sputtering and has been first described in 1853, when a glow discharge cathode was pulverized.¹ Sputtering constitutes a process that is of considerable importance in the field of glow discharges, plasma treatment of materials, and plasma deposition techniques, cf. elsewhere in these proceedings.²

The Physics of the Sputter Erosion Process

Urbassek, Herbert M.

When an energetic atom or ion hits a solid surface, atoms, molecules and clusters may be ejected as a consequence of the energy and momentum deposited in the solid. This phenomenon is known as sputtering and has been first described in 1853, when a glow discharge cathode was pulverized.¹ Sputtering constitutes a process that is of considerable importance in the field of glow discharges, plasma treatment of materials, and plasma deposition techniques, cf. elsewhere in these proceedings.²

Zugriff

Zugriff prüfen

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

The Physics of the Sputter Erosion Process

Beteiligte:

Auciello, Orlando (Herausgeber:in) / Gras-Marti, Alberto (Herausgeber:in) / Valles-Abarca, Jose Antonia (Herausgeber:in) / Flamm, Daniel L. (Herausgeber:in) / Urbassek, Herbert M. (Autor:in)

Erschienen in:

Plasma-Surface Interactions and Processing of Materials ; Kapitel: 15 ; 185-199

NATO ASI Series ; 176

Erscheinungsdatum:

01.01.1990

Format / Umfang:

15 pages

ISBN:

978-94-009-1946-4 , 978-94-010-7369-1

ISSN:

DOI:

https://doi.org/10.1007/978-94-009-1946-4_15

Medientyp:

Aufsatz/Kapitel (Buch)

Format:

Elektronische Ressource

Sprache:

Englisch

Schlagwörter:

Angular Distribution , Particle Flux , Target Atom , Collision Cascade , Surface Binding Energy Chemistry , Industrial Chemistry/Chemical Engineering , Characterization and Evaluation of Materials , Nuclear Physics, Heavy Ions, Hadrons , Physical Chemistry , Chemistry and Materials Science

Ähnliche Titel

Sputter-erosion dynamics of Ni(1 1 0) surface

Kahng, S. J. / Choi, B. Y. / Kuk, Y. | British Library Online Contents | 2001

Smoothing of rough a-Si:H surfaces by ion-assisted deposition and sputter erosion

Dalakos, G. T. / Plawsky, J. L. / Persans, P. D. | British Library Online Contents | 2006

60keV Ar^+-ion induced pattern formation on Si surface: Roles of sputter erosion and atomic redistribution

Garg, S. K. / Datta, D. P. / Kumar, M. et al. | British Library Online Contents | 2014

Physics of erosion of cohesive soils

Croad, R. N. | UB Braunschweig | 1981

Method for sputter rate determination in sputter depth profiling

Lopez, F. / Garcia-Cuenca, M. V. / Asensi, J. M. et al. | British Library Online Contents | 1993