Highly charged ion-secondary ion mass spectrometry (HCl-SIMS): toward metrology solutions for sub-100-nm technology nodes (Invited Paper) [4468-06]: Fid-Bau Portal

Highly charged ion-secondary ion mass spectrometry (HCl-SIMS): toward metrology solutions for sub-100-nm technology nodes (Invited Paper) [4468-06]

Schenkel, T. / Kraemer, A. / Leung, K. N. / Hamza, A. V. / McDonald, J. W. / Schneider, D. H. / International Society for Optical Engineering

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Highly charged ion-secondary ion mass spectrometry (HCl-SIMS): toward metrology solutions for sub-100-nm technology nodes (Invited Paper) [4468-06]

Schenkel, T. / Kraemer, A. / Leung, K. N. / Hamza, A. V. / McDonald, J. W. / Schneider, D. H. / International Society for Optical Engineering

Highly charged ion-secondary ion mass spectrometry (HCl-SIMS): toward metrology solutions for sub-100-nm technology nodes (Invited Paper) [4468-06]

Schenkel, T. / Kraemer, A. / Leung, K. N. / Hamza, A. V. / McDonald, J. W. / Schneider, D. H. / International Society for Optical Engineering

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Title:

Highly charged ion-secondary ion mass spectrometry (HCl-SIMS): toward metrology solutions for sub-100-nm technology nodes (Invited Paper) [4468-06]

Contributors:

Schenkel, T. (author) / Kraemer, A. (author) / Leung, K. N. (author) / Hamza, A. V. (author) / McDonald, J. W. (author) / Schneider, D. H. (author) / Knystautas, E. J. / Kirk, W. P. / Browning, V. / International Society for Optical Engineering

Conference:

Conference, Engineering thin films with ion beams, nanoscale diagnostics, and molecular manufacturing ; 2001 ; San Diego, CA

Published in:

Engineering thin films with ion beams, nanoscale diagnostics, and molecular manufacturing ; 35-46

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING ; 4468

Publication date:

2001-01-01

Size:

12 pages

ISBN:

0819441821

ISSN:

0277-786X

Type of media:

Conference paper

Type of material:

Language:

English

Keywords:

thin films , ion beams , nanoscale diagnostics , molecular manufacturing , SPIE

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