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    Accurate Evaluation Techniques of the Interstitial Oxygen Concentrations in the Oxygen Precipitated and the Low-Resistivity CZ-Si Crystals

    New search for: Kitagawara, Y.
    New search for: Takamizawa, K.
    New search for: Takenaka, T.
    New search for: Taguchi, T.

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    Accurate Evaluation Techniques of the Interstitial Oxygen Concentrations in the Oxygen Precipitated and the Low-Resistivity CZ-Si Crystals

    New search for: Kitagawara, Y.
    New search for: Takamizawa, K.
    New search for: Takenaka, T.
    New search for: Taguchi, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Accurate Evaluation Techniques of the Interstitial Oxygen Concentrations in the Oxygen Precipitated and the Low-Resistivity CZ-Si Crystals

    New search for: Kitagawara, Y.
    New search for: Takamizawa, K.
    New search for: Takenaka, T.
    New search for: Taguchi, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Accurate Evaluation Techniques of the Interstitial Oxygen Concentrations in the Oxygen Precipitated and the Low-Resistivity CZ-Si Crystals

    Contributors:

    Kitagawara, Y. (author) / Takamizawa, K. (author) / Takenaka, T. (author) / Taguchi, T.

    Published in:

    Shallow Impurities in Semiconductors ; 183

    MATERIALS SCIENCE FORUM

    Publication date:

    1993-01-01

    Size:

    183 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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