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    Chemical reactivity and gas flow dynamics considerations on atmospheric pressure chemical vapor deposition with silane precursor

    New search for: Jursich, G.
    New search for: Mulderink, K.
    New search for: Von Drasek, W.

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    Chemical reactivity and gas flow dynamics considerations on atmospheric pressure chemical vapor deposition with silane precursor

    New search for: Jursich, G.
    New search for: Mulderink, K.
    New search for: Von Drasek, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical reactivity and gas flow dynamics considerations on atmospheric pressure chemical vapor deposition with silane precursor

    New search for: Jursich, G.
    New search for: Mulderink, K.
    New search for: Von Drasek, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Chemical reactivity and gas flow dynamics considerations on atmospheric pressure chemical vapor deposition with silane precursor

    Contributors:

    Jursich, G. (author) / Mulderink, K. (author) / Von Drasek, W. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 17 ; 77

    Publication date:

    1993-01-01

    Size:

    77 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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