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    A new metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films

    New search for: Suh, S.
    New search for: Hoffman, D. M.
    New search for: Atagi, L. M.
    New search for: Smith, D. C.

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    A new metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films

    New search for: Suh, S.
    New search for: Hoffman, D. M.
    New search for: Atagi, L. M.
    New search for: Smith, D. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A new metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films

    New search for: Suh, S.
    New search for: Hoffman, D. M.
    New search for: Atagi, L. M.
    New search for: Smith, D. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A new metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films

    Contributors:

    Suh, S. (author) / Hoffman, D. M. (author) / Atagi, L. M. (author) / Smith, D. C. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 18 ; 789-792

    Publication date:

    1999-01-01

    Size:

    4 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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