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    Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    New search for: Choi, S. W.
    New search for: Bachmann, K. J.
    New search for: Lucovsky, G.

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    Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    New search for: Choi, S. W.
    New search for: Bachmann, K. J.
    New search for: Lucovsky, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    New search for: Choi, S. W.
    New search for: Bachmann, K. J.
    New search for: Lucovsky, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    Contributors:

    Choi, S. W. (author) / Bachmann, K. J. (author) / Lucovsky, G. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 8 ; 847

    Publication date:

    1993-01-01

    Size:

    847 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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