Hydrogen plasma-enhanced chemical vapour deposition of silicon carbide thin films from dodecamethylcyclohexasilane: Fid-Bau Portal

Hydrogen plasma-enhanced chemical vapour deposition of silicon carbide thin films from dodecamethylcyclohexasilane

Chiu, H.-T. / Huang, S.-C.

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Hydrogen plasma-enhanced chemical vapour deposition of silicon carbide thin films from dodecamethylcyclohexasilane

Chiu, H.-T. / Huang, S.-C.

Hydrogen plasma-enhanced chemical vapour deposition of silicon carbide thin films from dodecamethylcyclohexasilane

Chiu, H.-T. / Huang, S.-C.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Hydrogen plasma-enhanced chemical vapour deposition of silicon carbide thin films from dodecamethylcyclohexasilane

Contributors:

Chiu, H.-T. (author) / Huang, S.-C. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 12 ; 537

Publication date:

1993-01-01

Size:

537 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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