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    Structural study of plasma enhanced chemical vapour deposited silicon carbide films

    New search for: Choi, W. K.
    New search for: Gangadharan, S.

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    Structural study of plasma enhanced chemical vapour deposited silicon carbide films

    New search for: Choi, W. K.
    New search for: Gangadharan, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural study of plasma enhanced chemical vapour deposited silicon carbide films

    New search for: Choi, W. K.
    New search for: Gangadharan, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Structural study of plasma enhanced chemical vapour deposited silicon carbide films

    Contributors:

    Choi, W. K. (author) / Gangadharan, S. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 75 ; 174 - 176

    Publication date:

    2000-01-01

    Size:

    3 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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