Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield: Fid-Bau Portal

Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

Aliouchouche, A. / Boulmer, J. / Bourguignon, B. / Budin, J.-P.

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Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

Aliouchouche, A. / Boulmer, J. / Bourguignon, B. / Budin, J.-P.

Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

Aliouchouche, A. / Boulmer, J. / Bourguignon, B. / Budin, J.-P.

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Check availability in my library

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Document information

Title:

Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield

Contributors:

Aliouchouche, A. (author) / Boulmer, J. (author) / Bourguignon, B. (author) / Budin, J.-P. (author)

Published in:

APPLIED SURFACE SCIENCE ; 69 ; 52

Publication date:

1993-01-01

Size:

52 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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