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Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield
Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield
Laser etching of silicon by chlorine: effect of post-desorption collisions and chlorine in-diffusion on the laser desorption yield
Aliouchouche, A. (author) / Boulmer, J. (author) / Bourguignon, B. (author) / Budin, J.-P. (author)
APPLIED SURFACE SCIENCE ; 69 ; 52
1993-01-01
52 pages
Article (Journal)
Unknown
DDC:
621.35
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