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    Thermal stability of W on RTCVD Si~1~-~xGe~x films

    New search for: Aubry, V.
    New search for: Meyer, F.
    New search for: Laval, R.
    New search for: Clerc, C.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

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    Thermal stability of W on RTCVD Si~1~-~xGe~x films

    New search for: Aubry, V.
    New search for: Meyer, F.
    New search for: Laval, R.
    New search for: Clerc, C.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal stability of W on RTCVD Si~1~-~xGe~x films

    New search for: Aubry, V.
    New search for: Meyer, F.
    New search for: Laval, R.
    New search for: Clerc, C.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thermal stability of W on RTCVD Si~1~-~xGe~x films

    Contributors:

    Aubry, V. (author) / Meyer, F. (author) / Laval, R. (author) / Clerc, C. (author) / Janssen, G. C. A. M. / Jongste, J. F. / Radelaar, S.

    Published in:

    Proceedings of the Fifth European Workshop on Refractory Metals and Silicides ; 285

    APPLIED SURFACE SCIENCE ; 72

    Publication date:

    1993-01-01

    Size:

    285 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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