A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Ribot, P. (author) / Dutartre, D. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 306 - 309
2002-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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