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Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y. / Miyano, T. / Fujimoto, K. / Fujito, M.

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Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y. / Miyano, T. / Fujimoto, K. / Fujito, M.

Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y. / Miyano, T. / Fujimoto, K. / Fujito, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

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Document information

Title:

Anisotropic ECR Plasma Etching with Low-Energy Ions

Contributors:

Tobinaga, Y. (author) / Miyano, T. (author) / Fujimoto, K. (author) / Fujito, M. (author)

Published in:

MATERIALS SCIENCE FORUM ; 39

Publication date:

1993-01-01

Size:

39 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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