Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD: Fid-Bau Portal

Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

Vuillod, J.

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Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

Vuillod, J.

Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

Vuillod, J.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD

Contributors:

Vuillod, J. (author)

Published in:

MATERIALS SCIENCE FORUM ; 301

Publication date:

1993-01-01

Size:

301 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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