Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Mukhopadhyay, S. / Ray, S. | British Library Online Contents | 2011

Silicon carbon nitride cones prepared from an ellipsoid microwave plasma chemical vapor deposition reactor

Cheng, W. J. / Jiang, J. C. / Zhang, Y. et al. | British Library Online Contents | 2004

Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

Jun, B.-H. / Joon Sing Lee / Kim, D.-W. et al. | British Library Online Contents | 1999

Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J. / Jiang, J. C. / Zhang, Y. et al. | British Library Online Contents | 2005

Effect of silicon impurity on carbon nitride films prepared by microwave plasma chemical vapor deposition

Zhang, Y. P. / Gu, Y. S. | British Library Online Contents | 2001