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    The Si/SiO~2 interface trap density in boron/germanium- and phosphorus/germanium-implanted silicon

    New search for: Peterstroem, S.

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    The Si/SiO~2 interface trap density in boron/germanium- and phosphorus/germanium-implanted silicon

    New search for: Peterstroem, S.

    Access

    Access via TIB
    Check availability in my library
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    The Si/SiO~2 interface trap density in boron/germanium- and phosphorus/germanium-implanted silicon

    New search for: Peterstroem, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    The Si/SiO~2 interface trap density in boron/germanium- and phosphorus/germanium-implanted silicon

    Contributors:

    Peterstroem, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 74 ; 243

    Publication date:

    1994-01-01

    Size:

    243 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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