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    High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition

    New search for: Kawai, C.

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    High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition

    New search for: Kawai, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition

    New search for: Kawai, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition

    Contributors:

    Kawai, C. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 13 ; 860

    Publication date:

    1994-01-01

    Size:

    860 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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