A platform for research: civil engineering, architecture and urbanism
Single molecular precursor metal-organic chemical vapor deposition of MgAl~2O~4 thin films
Single molecular precursor metal-organic chemical vapor deposition of MgAl~2O~4 thin films
Single molecular precursor metal-organic chemical vapor deposition of MgAl~2O~4 thin films
Zhang, J. (author) / Stauf, G. T. (author) / Gardiner, R. (author) / Van Buskirk, P. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 9 ; 1333
1994-01-01
1333 pages
Article (Journal)
Unknown
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films
British Library Online Contents | 2006
|Metal-organic chemical vapor deposition of indium selenide films using a single-source precursor
British Library Online Contents | 2005
|Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor
British Library Online Contents | 1994
|Metal organic chemical vapor deposition growth of Cd1-xFexSe thin films
British Library Online Contents | 2008
|RuO~2 films by metal-organic chemical vapor deposition
British Library Online Contents | 1993
|