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Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor

Hoffman, D. M. / Sri Prakash Rangarajan / Athavale, S. D. / Deshmukh, S. C.

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Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor

Hoffman, D. M. / Sri Prakash Rangarajan / Athavale, S. D. / Deshmukh, S. C.

Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor

Hoffman, D. M. / Sri Prakash Rangarajan / Athavale, S. D. / Deshmukh, S. C.

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Check availability in my library

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Document information

Title:

Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor

Contributors:

Hoffman, D. M. (author) / Sri Prakash Rangarajan (author) / Athavale, S. D. (author) / Deshmukh, S. C. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 9 ; 3019

Publication date:

1994-01-01

Size:

3019 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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