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    A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films

    New search for: Xin, Y.
    New search for: Qiuyu, Z.
    New search for: Xiaodong, F.

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    A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films

    New search for: Xin, Y.
    New search for: Qiuyu, Z.
    New search for: Xiaodong, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films

    New search for: Xin, Y.
    New search for: Qiuyu, Z.
    New search for: Xiaodong, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films

    Contributors:

    Xin, Y. (author) / Qiuyu, Z. (author) / Xiaodong, F. (author)

    Published in:

    RARE METAL MATERIALS AND ENGINEERING ; 35 ; 1129-1131

    Publication date:

    2006-01-01

    Size:

    3 pages

    ISSN:

    1002-185X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  669

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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