Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition

    Contributors:

    Uesugi, F. (author) / Nishiyama, I. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 79/80 ; 203

    Publication date:

    1994-01-01

    Size:

    203 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

    Nishiyama, I. / Uesugi, F. | British Library Online Contents | 1996

    Synchrotron-radiation-induced growth suppression and initiation in molecular-beam chemical vapor deposition of aluminum

    Uesugi, F. / Nishiyama, I. | British Library Online Contents | 1992

    Temperature dependence of synchrotron radiation induced growth initiation in the molecular beam chemical vapor deposition of Al on a SiO~2 surface

    Uesugi, F. / Nishiyama, I. | British Library Online Contents | 1993

    Direct projection patterning of aluminum on the SiO~2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

    Uesugi, F. / Nishiyama, I. | British Library Online Contents | 1992

    Rheotaxial diamond growth by chemical vapor deposition

    Fang, P. H. / Hou, L. | British Library Online Contents | 2000

    Back to top