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    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

    New search for: Nishiyama, I.
    New search for: Uesugi, F.

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    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

    New search for: Nishiyama, I.
    New search for: Uesugi, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

    New search for: Nishiyama, I.
    New search for: Uesugi, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

    Contributors:

    Nishiyama, I. (author) / Uesugi, F. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 103 ; 299-306

    Publication date:

    1996-01-01

    Size:

    8 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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