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    Direct projection patterning of aluminum on the SiO~2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

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    Direct projection patterning of aluminum on the SiO~2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Direct projection patterning of aluminum on the SiO~2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

    New search for: Uesugi, F.
    New search for: Nishiyama, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Direct projection patterning of aluminum on the SiO~2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

    Contributors:

    Uesugi, F. (author) / Nishiyama, I. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 62 ; 151

    Publication date:

    1992-01-01

    Size:

    151 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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