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    Copper diffusivity in silicon: A re-examination

    New search for: Mesli, A.
    New search for: Heiser, T.
    New search for: Mulheim, E.

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    Copper diffusivity in silicon: A re-examination

    New search for: Mesli, A.
    New search for: Heiser, T.
    New search for: Mulheim, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Copper diffusivity in silicon: A re-examination

    New search for: Mesli, A.
    New search for: Heiser, T.
    New search for: Mulheim, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Copper diffusivity in silicon: A re-examination

    Contributors:

    Mesli, A. (author) / Heiser, T. (author) / Mulheim, E. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 25 ; 141

    Publication date:

    1994-01-01

    Size:

    141 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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