Metal-organic chemical vapor deposition of ZrO~2 films using Zr(thd)~4 as precursors: Fid-Bau Portal

Metal-organic chemical vapor deposition of ZrO~2 films using Zr(thd)~4 as precursors

Si, J. / Desu, S. B. / Tsai, C.-Y.

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Metal-organic chemical vapor deposition of ZrO~2 films using Zr(thd)~4 as precursors

Si, J. / Desu, S. B. / Tsai, C.-Y.

Metal-organic chemical vapor deposition of ZrO~2 films using Zr(thd)~4 as precursors

Si, J. / Desu, S. B. / Tsai, C.-Y.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Metal-organic chemical vapor deposition of ZrO~2 films using Zr(thd)~4 as precursors

Contributors:

Si, J. (author) / Desu, S. B. (author) / Tsai, C.-Y. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 9 ; 1721

Publication date:

1994-01-01

Size:

1721 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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