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The Formation of Silicon Carbide Films from Disilane Derivatives

Hengge, E. / Zechmann, A. / Hofer, F. / Poelt, P.

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The Formation of Silicon Carbide Films from Disilane Derivatives

Hengge, E. / Zechmann, A. / Hofer, F. / Poelt, P.

The Formation of Silicon Carbide Films from Disilane Derivatives

Hengge, E. / Zechmann, A. / Hofer, F. / Poelt, P.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The Formation of Silicon Carbide Films from Disilane Derivatives

Contributors:

Hengge, E. (author) / Zechmann, A. (author) / Hofer, F. (author) / Poelt, P. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH- ; 6 ; 584

Publication date:

1994-01-01

Size:

584 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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