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SIMS study of rapid thermal nitridation of silicon dioxide thick films in ammonia ambient

Breelle, E. / Rigo, S. / Kilner, J. A. / Ganem, J.-J.

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SIMS study of rapid thermal nitridation of silicon dioxide thick films in ammonia ambient

Breelle, E. / Rigo, S. / Kilner, J. A. / Ganem, J.-J.

SIMS study of rapid thermal nitridation of silicon dioxide thick films in ammonia ambient

Breelle, E. / Rigo, S. / Kilner, J. A. / Ganem, J.-J.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

SIMS study of rapid thermal nitridation of silicon dioxide thick films in ammonia ambient

Contributors:

Breelle, E. (author) / Rigo, S. (author) / Kilner, J. A. (author) / Ganem, J.-J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 81 ; 127

Publication date:

1994-01-01

Size:

127 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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