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Ion implantation of silicon wafers for defect-reduced doped layer formation with low dopant atom diffusion
Ion implantation of silicon wafers for defect-reduced doped layer formation with low dopant atom diffusion
Ion implantation of silicon wafers for defect-reduced doped layer formation with low dopant atom diffusion
Shigenaka, N. (author) / Ono, S. (author) / Hashimoto, T. (author) / Fuse, M. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 9 ; 2987
1994-01-01
2987 pages
Article (Journal)
Unknown
DDC:
620.11
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