Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, H.J. / Kim, S.H. / Hong, S.H. | British Library Online Contents | 2000

ArF-excimer laser induced chemical vapour deposition of amorphous hydrogenated SiGeC films

Lopez, E. / Chiussi, S. / Serra, C. et al. | British Library Online Contents | 2003

The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Durand-Drouhin, O. / Lejeune, M. / Bouzerar, R. et al. | British Library Online Contents | 2001

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Jiang, J. / Cheng, W. / Zhang, Y. et al. | British Library Online Contents | 2007