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    Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

    New search for: Ryu, H.J.
    New search for: Kim, S.H.
    New search for: Hong, S.H.

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    Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

    New search for: Ryu, H.J.
    New search for: Kim, S.H.
    New search for: Hong, S.H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

    New search for: Ryu, H.J.
    New search for: Kim, S.H.
    New search for: Hong, S.H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

    Contributors:

    Ryu, H.J. (author) / Kim, S.H. (author) / Hong, S.H. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- A ; 277 ; 57 - 63

    Publication date:

    2000-01-01

    Size:

    7 pages

    ISSN:

    0921-5093

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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