A platform for research: civil engineering, architecture and urbanism
Selective epitaxial growth of GaInP by LP-MOCVD using ethyldimethylindium, trimethylindium, trimethylgallium and triethylgallium as group III sources
Selective epitaxial growth of GaInP by LP-MOCVD using ethyldimethylindium, trimethylindium, trimethylgallium and triethylgallium as group III sources
Selective epitaxial growth of GaInP by LP-MOCVD using ethyldimethylindium, trimethylindium, trimethylgallium and triethylgallium as group III sources
Chan, S.-H. (author) / Sze, S. M. (author) / Chang, C.-Y. (author) / Lee, W.-I. (author)
APPLIED SURFACE SCIENCE ; 82/83 ; 85
1994-01-01
85 pages
Article (Journal)
Unknown
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
GaN Grown Using Trimethylgallium and Triethylgallium
British Library Online Contents | 1997
|Chemical beam epitaxial growth of GaAs from tertiarybutylarsine and triethylgallium precursors
British Library Online Contents | 1994
|Chemical beam epitaxial growth of GaInP using uncracked trisdimethylaminophosphine
British Library Online Contents | 2006
|Chemical beam epitaxial growth of GaInP using TBP, TIPGa and EDMIn
British Library Online Contents | 2003
|