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    Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

    New search for: Ulrych, I.
    New search for: El-Kader, K. M. A.
    New search for: Chab, V.
    New search for: Kocka, J.
    New search for: Brieger, M.
    New search for: Dittrich, H.
    New search for: Klose, M.
    New search for: Schock, H. W.

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    Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

    New search for: Ulrych, I.
    New search for: El-Kader, K. M. A.
    New search for: Chab, V.
    New search for: Kocka, J.
    New search for: Brieger, M.
    New search for: Dittrich, H.
    New search for: Klose, M.
    New search for: Schock, H. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

    New search for: Ulrych, I.
    New search for: El-Kader, K. M. A.
    New search for: Chab, V.
    New search for: Kocka, J.
    New search for: Brieger, M.
    New search for: Dittrich, H.
    New search for: Klose, M.
    New search for: Schock, H. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

    Contributors:

    Ulrych, I. (author) / El-Kader, K. M. A. (author) / Chab, V. (author) / Kocka, J. (author) / Brieger, M. / Dittrich, H. / Klose, M. / Schock, H. W.

    Published in:

    Applications in Photovoltaics ; 29

    MATERIALS SCIENCE FORUM

    Publication date:

    1995-01-01

    Size:

    29 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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