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Slow positron implantation spectroscopy of edge-defined film-fed growth silicon

Coleman, P. G. / Bloss, E. / Setzler, S. / LaShell, S.

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Slow positron implantation spectroscopy of edge-defined film-fed growth silicon

Coleman, P. G. / Bloss, E. / Setzler, S. / LaShell, S.

Slow positron implantation spectroscopy of edge-defined film-fed growth silicon

Coleman, P. G. / Bloss, E. / Setzler, S. / LaShell, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Slow positron implantation spectroscopy of edge-defined film-fed growth silicon

Contributors:

Coleman, P. G. (author) / Bloss, E. (author) / Setzler, S. (author) / LaShell, S. (author) / Doyama, M. / Akahane, T. / Fujinami, M.

Published in:

Proceedings of the Sixth International Workshop on Slow-Positron Beam Techniques for Solids and Surfaces ; 276

APPLIED SURFACE SCIENCE ; 85

Publication date:

1995-01-01

Size:

276 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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