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Enhancement of depth sensitivity in slow positron implantation spectroscopy of Si

Coleman, P.G. / Knights, A.P.

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Enhancement of depth sensitivity in slow positron implantation spectroscopy of Si

Coleman, P.G. / Knights, A.P.

Enhancement of depth sensitivity in slow positron implantation spectroscopy of Si

Coleman, P.G. / Knights, A.P.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Enhancement of depth sensitivity in slow positron implantation spectroscopy of Si

Contributors:

Coleman, P.G. (author) / Knights, A.P. (author)

Published in:

APPLIED SURFACE SCIENCE ; 149 ; 82-86

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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