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    Selective low pressure chemical vapour deposition epitaxy using silane only for advanced device applications

    New search for: Bonar, J. M.
    New search for: Parker, G. J.

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    Selective low pressure chemical vapour deposition epitaxy using silane only for advanced device applications

    New search for: Bonar, J. M.
    New search for: Parker, G. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Selective low pressure chemical vapour deposition epitaxy using silane only for advanced device applications

    New search for: Bonar, J. M.
    New search for: Parker, G. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Selective low pressure chemical vapour deposition epitaxy using silane only for advanced device applications

    Contributors:

    Bonar, J. M. (author) / Parker, G. J. (author)

    Published in:

    MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 11 ; 31

    Publication date:

    1995-01-01

    Size:

    31 pages

    ISSN:

    0267-0836

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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