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    Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane

    New search for: Carabe, J.
    New search for: Ganda, J.J.
    New search for: Gonzalez, N.
    New search for: Rodrguez, A.
    New search for: Gutierrez, M.T.

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    Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane

    New search for: Carabe, J.
    New search for: Ganda, J.J.
    New search for: Gonzalez, N.
    New search for: Rodrguez, A.
    New search for: Gutierrez, M.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane

    New search for: Carabe, J.
    New search for: Ganda, J.J.
    New search for: Gonzalez, N.
    New search for: Rodrguez, A.
    New search for: Gutierrez, M.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane

    Contributors:

    Carabe, J. (author) / Ganda, J.J. (author) / Gonzalez, N. (author) / Rodrguez, A. (author) / Gutierrez, M.T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 143 ; 11-15

    Publication date:

    1999-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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