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Localised strain characterization in semiconductor structures using electron diffraction contrast imaging

Janssens, K. G. F. / Van der Biest, O. / Vanhellemont, J. / Maes, H. E.

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Localised strain characterization in semiconductor structures using electron diffraction contrast imaging

Janssens, K. G. F. / Van der Biest, O. / Vanhellemont, J. / Maes, H. E.

Localised strain characterization in semiconductor structures using electron diffraction contrast imaging

Janssens, K. G. F. / Van der Biest, O. / Vanhellemont, J. / Maes, H. E.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Localised strain characterization in semiconductor structures using electron diffraction contrast imaging

Contributors:

Janssens, K. G. F. (author) / Van der Biest, O. (author) / Vanhellemont, J. (author) / Maes, H. E. (author)

Published in:

MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 11 ; 66

Publication date:

1995-01-01

Size:

66 pages

ISSN:

0267-0836

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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