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Mechanisms of intrinsic stresses generation in sputtered amorphous Si:H films

Takahashi, H. / Nagata, H. / Kataoka, H. / Takai, H.

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Mechanisms of intrinsic stresses generation in sputtered amorphous Si:H films

Takahashi, H. / Nagata, H. / Kataoka, H. / Takai, H.

Mechanisms of intrinsic stresses generation in sputtered amorphous Si:H films

Takahashi, H. / Nagata, H. / Kataoka, H. / Takai, H.

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Order at Subito €

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Document information

Title:

Mechanisms of intrinsic stresses generation in sputtered amorphous Si:H films

Contributors:

Takahashi, H. (author) / Nagata, H. (author) / Kataoka, H. (author) / Takai, H. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 10 ; 2736

Publication date:

1995-01-01

Size:

2736 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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