Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Avoiding end-of-range dislocations in ion-implanted silicon

    New search for: Acco, S.
    New search for: Custer, J. S.
    New search for: Saris, F. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Avoiding end-of-range dislocations in ion-implanted silicon

    New search for: Acco, S.
    New search for: Custer, J. S.
    New search for: Saris, F. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Avoiding end-of-range dislocations in ion-implanted silicon

    New search for: Acco, S.
    New search for: Custer, J. S.
    New search for: Saris, F. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Avoiding end-of-range dislocations in ion-implanted silicon

    Contributors:

    Acco, S. (author) / Custer, J. S. (author) / Saris, F. W. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 34 ; 168-174

    Publication date:

    1995-01-01

    Size:

    7 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Range Distributions of Implanted Ions in Silicon Carbide

    Janson, M. S. / Linnarsson, M. K. / Hallen, A. et al. | British Library Online Contents | 2002

    Observation of dislocations in strain-relaxed silicon-germanium thin films with flat surfaces grown on ion-implanted silicon substrates

    Yamanaka, J. / Sawano, K. / Nakagawa, K. et al. | British Library Online Contents | 2004

    Short Range Interaction between Dislocations

    Kroupa, F. | British Library Online Contents | 1994

    The Range Distribution of Er Ions Implanted in Silicon Crystal

    Qin, X.F. / Liang, Y. / Wang, F.X. | British Library Online Contents | 2011

    Effect of implanted O on gettering of Au at dislocations in Si

    Mohapatra, S. / Mahapatra, D. P. | British Library Online Contents | 2006

    Back to top