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    Properties of thermally annealed undoped and sulphur doped InP wafers

    New search for: Fornari, R.
    New search for: Weyher, J. L.
    New search for: Krawczyk, S.
    New search for: Nuban, F.
    New search for: Corbel, C.
    New search for: Toernqvist, M.

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    Properties of thermally annealed undoped and sulphur doped InP wafers

    New search for: Fornari, R.
    New search for: Weyher, J. L.
    New search for: Krawczyk, S.
    New search for: Nuban, F.
    New search for: Corbel, C.
    New search for: Toernqvist, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of thermally annealed undoped and sulphur doped InP wafers

    New search for: Fornari, R.
    New search for: Weyher, J. L.
    New search for: Krawczyk, S.
    New search for: Nuban, F.
    New search for: Corbel, C.
    New search for: Toernqvist, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Properties of thermally annealed undoped and sulphur doped InP wafers

    Contributors:

    Fornari, R. (author) / Weyher, J. L. (author) / Krawczyk, S. (author) / Nuban, F. (author) / Corbel, C. (author) / Toernqvist, M. (author)

    Published in:

    MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 11 ; 1223-1228

    Publication date:

    1995-01-01

    Size:

    6 pages

    ISSN:

    0267-0836

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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