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    Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity

    New search for: Iwasaki, T.
    New search for: Harada, H.
    New search for: Haga, H.

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    Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity

    New search for: Iwasaki, T.
    New search for: Harada, H.
    New search for: Haga, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity

    New search for: Iwasaki, T.
    New search for: Harada, H.
    New search for: Haga, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity

    Contributors:

    Iwasaki, T. (author) / Harada, H. (author) / Haga, H. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 1731-1736

    Publication date:

    1995-01-01

    Size:

    6 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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