Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity
Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity
Influence of Point Defect Concentration in Growing Cz-Si on the Formation Temperature of the Defects Affecting Gate Oxide Integrity
Iwasaki, T. (Autor:in) / Harada, H. (Autor:in) / Haga, H. (Autor:in)
MATERIALS SCIENCE FORUM ; 1731-1736
01.01.1995
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Substrate defects affecting gate oxide integrity
British Library Online Contents | 2000
|Review of the Influence of Micro Crystal Defects in Silicon Single Crystals on Gate Oxide Integrity
British Library Online Contents | 1995
|Thickness dependent integrity of gate oxide on SOI
British Library Online Contents | 2003
|Void Formation in Growing Oxide Scales with Schottky Defects and P-Type Conduction
British Library Online Contents | 2008
|Gate oxide integrity dependence on substrate characteristics and SiO2 thickness
British Library Online Contents | 2001
|